Listed are many semiconductor scale examples for various metal–oxide–semiconductor field-effect transistor (MOSFET, or MOS transistor) semiconductor manufacturing process nodes.
Timeline of MOSFET demonstrations
PMOS and NMOS
| Date | Channel length | Oxide thickness | MOSFET logic | Researcher(s) | Organization | Ref |
|---|---|---|---|---|---|---|
| June 1960 | 20,000 nm | 100 nm | PMOS | Mohamed M. Atalla, Dawon Kahng | Bell Telephone Laboratories | |
| NMOS | ||||||
| 10,000 nm | 100 nm | PMOS | Mohamed M. Atalla, Dawon Kahng | Bell Telephone Laboratories | ||
| NMOS | ||||||
| May 1965 | 8,000 nm | 150 nm | NMOS | Chih-Tang Sah, Otto Leistiko, A.S. Grove | Fairchild Semiconductor | |
| 5,000 nm | 170 nm | PMOS | ||||
| December 1972 | 1,000 nm | ? | PMOS | Robert H. Dennard, Fritz H. Gaensslen, Hwa-Nien Yu | IBM T.J. Watson Research Center | |
| 1973 | 7,500 nm | ? | NMOS | Sohichi Suzuki | NEC | |
| 6,000 nm | ? | PMOS | ? | Toshiba | ||
| October 1974 | 1,000 nm | 35 nm | NMOS | Robert H. Dennard, Fritz H. Gaensslen, Hwa-Nien Yu | IBM T.J. Watson Research Center | |
| 500 nm | ||||||
| September 1975 | 1,500 nm | 20 nm | NMOS | Ryoichi Hori, Hiroo Masuda, Osamu Minato | Hitachi | |
| March 1976 | 3,000 nm | ? | NMOS | ? | Intel | |
| April 1979 | 1,000 nm | 25 nm | NMOS | William R. Hunter, L. M. Ephrath, Alice Cramer | IBM T.J. Watson Research Center | |
| December 1984 | 100 nm | 5 nm | NMOS | Toshio Kobayashi, Seiji Horiguchi, K. Kiuchi | Nippon Telegraph and Telephone | |
| December 1985 | 150 nm | 2.5 nm | NMOS | Toshio Kobayashi, Seiji Horiguchi, M. Miyake, M. Oda | Nippon Telegraph and Telephone | |
| 75 nm | ? | NMOS | Stephen Y. Chou, Henry I. Smith, Dimitri A. Antoniadis | MIT | ||
| January 1986 | 60 nm | ? | NMOS | Stephen Y. Chou, Henry I. Smith, Dimitri A. Antoniadis | MIT | |
| June 1987 | 200 nm | 3.5 nm | PMOS | Toshio Kobayashi, M. Miyake, K. Deguchi | Nippon Telegraph and Telephone | |
| December 1993 | 40 nm | ? | NMOS | Mizuki Ono, Masanobu Saito, Takashi Yoshitomi | Toshiba | |
| September 1996 | 16 nm | ? | PMOS | Hisao Kawaura, Toshitsugu Sakamoto, Toshio Baba | NEC | |
| June 1998 | 50 nm | 1.3 nm | NMOS | Khaled Z. Ahmed, Effiong E. Ibok, Miryeong Song | Advanced Micro Devices (AMD) | |
| December 2002 | 6 nm | ? | PMOS | Bruce Doris, Omer Dokumaci, Meikei Ieong | IBM | |
| December 2003 | 3 nm | ? | PMOS | Hitoshi Wakabayashi, Shigeharu Yamagami | NEC | |
| ? | NMOS |
CMOS (single-gate)
| Date | Channel length | Oxide thickness | Researcher(s) | Organization | Ref |
|---|---|---|---|---|---|
| February 1963 | ? | ? | Chih-Tang Sah, Frank Wanlass | Fairchild Semiconductor | |
| 1968 | 20,000 nm | 100 nm | ? | RCA Laboratories | |
| 1970 | 10,000 nm | 100 nm | ? | RCA Laboratories | |
| December 1976 | 2,000 nm | ? | A. Aitken, R.G. Poulsen, A.T.P. MacArthur, J.J. White | Mitel Semiconductor | |
| February 1978 | 3,000 nm | ? | Toshiaki Masuhara, Osamu Minato, Toshio Sasaki, Yoshio Sakai | Hitachi Central Research Laboratory | |
| February 1983 | 1,200 nm | 25 nm | R.J.C. Chwang, M. Choi, D. Creek, S. Stern, P.H. Pelley | Intel | |
| 900 nm | 15 nm | Tsuneo Mano, J. Yamada, Junichi Inoue, S. Nakajima | Nippon Telegraph and Telephone (NTT) | ||
| December 1983 | 1,000 nm | 22.5 nm | G.J. Hu, Yuan Taur, Robert H. Dennard, Chung-Yu Ting | IBM T.J. Watson Research Center | |
| February 1987 | 800 nm | 17 nm | T. Sumi, Tsuneo Taniguchi, Mikio Kishimoto, Hiroshige Hirano | Matsushita | |
| 700 nm | 12 nm | Tsuneo Mano, J. Yamada, Junichi Inoue, S. Nakajima | Nippon Telegraph and Telephone (NTT) | ||
| September 1987 | 500 nm | 12.5 nm | Hussein I. Hanafi, Robert H. Dennard, Yuan Taur, Nadim F. Haddad | IBM T.J. Watson Research Center | |
| December 1987 | 250 nm | ? | Naoki Kasai, Nobuhiro Endo, Hiroshi Kitajima | NEC | |
| February 1988 | 400 nm | 10 nm | M. Inoue, H. Kotani, T. Yamada, Hiroyuki Yamauchi | Matsushita | |
| December 1990 | 100 nm | ? | Ghavam G. Shahidi, Bijan Davari, Yuan Taur, James D. Warnock | IBM T.J. Watson Research Center | |
| 1993 | 350 nm | ? | ? | Sony | |
| 1996 | 150 nm | ? | ? | Mitsubishi Electric | |
| 1998 | 180 nm | ? | ? | TSMC | |
| December 2003 | 5 nm | ? | Hitoshi Wakabayashi, Shigeharu Yamagami, Nobuyuki Ikezawa | NEC |
Multi-gate MOSFET (MuGFET)
| Date | Channel length | MuGFET type | Researcher(s) | Organization | Ref |
|---|---|---|---|---|---|
| August 1984 | ? | DGMOS | Toshihiro Sekigawa, Yutaka Hayashi | Electrotechnical Laboratory (ETL) | |
| 1987 | 2,000 nm | DGMOS | Toshihiro Sekigawa | Electrotechnical Laboratory (ETL) | |
| December 1988 | 250 nm | DGMOS | Bijan Davari, Wen-Hsing Chang, Matthew R. Wordeman, C.S. Oh | IBM T.J. Watson Research Center | |
| 180 nm | |||||
| ? | GAAFET | Fujio Masuoka, Hiroshi Takato, Kazumasa Sunouchi, N. Okabe | Toshiba | ||
| December 1989 | 200 nm | FinFET | Digh Hisamoto, Toru Kaga, Yoshifumi Kawamoto, Eiji Takeda | Hitachi Central Research Laboratory | |
| December 1998 | 17 nm | FinFET | Digh Hisamoto, Chenming Hu, Tsu-Jae King Liu, Jeffrey Bokor | University of California (Berkeley) | |
| 2001 | 15 nm | FinFET | Chenming Hu, Yang-Kyu Choi, Nick Lindert, Tsu-Jae King Liu | University of California (Berkeley) | |
| December 2002 | 10 nm | FinFET | Shibly Ahmed, Scott Bell, Cyrus Tabery, Jeffrey Bokor | University of California (Berkeley) | |
| June 2006 | 3 nm | GAAFET | Hyunjin Lee, Yang-kyu Choi, Lee-Eun Yu, Seong-Wan Ryu | KAIST |
Other types of MOSFET
| Date | Channel length (nm) | Oxide thickness (nm) | MOSFET type | Researcher(s) | Organization | Ref |
|---|---|---|---|---|---|---|
| October 1962 | ? | ? | TFT | Paul K. Weimer | RCA Laboratories | |
| 1965 | ? | ? | GaAs | H. Becke, R. Hall, J. White | RCA Laboratories | |
| October 1966 | 100,000 | 100 | TFT | T.P. Brody, H.E. Kunig | Westinghouse Electric | |
| August 1967 | ? | ? | FGMOS | Dawon Kahng, Simon Min Sze | Bell Telephone Laboratories | |
| October 1967 | ? | ? | MNOS | H.A. Richard Wegener, A.J. Lincoln, H.C. Pao | Sperry Corporation | |
| July 1968 | ? | ? | BiMOS | Hung-Chang Lin, Ramachandra R. Iyer | Westinghouse Electric | |
| October 1968 | ? | ? | BiCMOS | Hung-Chang Lin, Ramachandra R. Iyer, C.T. Ho | Westinghouse Electric | |
| 1969 | ? | ? | VMOS | ? | Hitachi | |
| September 1969 | ? | ? | DMOS | Y. Tarui, Y. Hayashi, Toshihiro Sekigawa | Electrotechnical Laboratory (ETL) | |
| October 1970 | ? | ? | ISFET | Piet Bergveld | University of Twente | |
| October 1970 | 1000 | ? | DMOS | Y. Tarui, Y. Hayashi, Toshihiro Sekigawa | Electrotechnical Laboratory (ETL) | |
| 1977 | ? | ? | VDMOS | John Louis Moll | HP Labs | |
| ? | ? | LDMOS | ? | Hitachi | ||
| July 1979 | ? | ? | IGBT | Bantval Jayant Baliga, Margaret Lazeri | General Electric | |
| December 1984 | 2000 | ? | BiCMOS | H. Higuchi, Goro Kitsukawa, Takahide Ikeda, Y. Nishio | Hitachi | |
| May 1985 | 300 | ? | ? | K. Deguchi, Kazuhiko Komatsu, M. Miyake, H. Namatsu | Nippon Telegraph and Telephone | |
| February 1985 | 1000 | ? | BiCMOS | H. Momose, Hideki Shibata, S. Saitoh, Jun-ichi Miyamoto | Toshiba | |
| November 1986 | 90 | 8.3 | ? | Han-Sheng Lee, L.C. Puzio | General Motors | |
| December 1986 | 60 | ? | ? | Ghavam G. Shahidi, Dimitri A. Antoniadis, Henry I. Smith | MIT | |
| May 1987 | ? | 10 | ? | Bijan Davari, Chung-Yu Ting, Kie Y. Ahn, S. Basavaiah | IBM T.J. Watson Research Center | |
| December 1987 | 800 | ? | BiCMOS | Robert H. Havemann, R. E. Eklund, Hiep V. Tran | Texas Instruments | |
| June 1997 | 30 | ? | EJ-MOSFET | Hisao Kawaura, Toshitsugu Sakamoto, Toshio Baba | NEC | |
| 1998 | 32 | ? | ? | ? | NEC | |
| 1999 | 8 | ? | ? | ? | ||
| April 2000 | 8 | ? | EJ-MOSFET | Hisao Kawaura, Toshitsugu Sakamoto, Toshio Baba | NEC |
Commercial products using micro-scale MOSFETs
Products featuring 20 μm manufacturing process
- RCA's CD4000 series of integrated circuits (ICs) beginning in 1968.
Products featuring 10 μm manufacturing process
- Intel 4004, the first single-chip microprocessor CPU, launched in 1971.
- Intel 8008 CPU launched in 1972.
Products featuring 8 μm manufacturing process
- Intel 1103, an early dynamic random-access memory (DRAM) chip launched in 1970.
- MOS Technology 6502 1 MHz CPU launched in 1975.
Products featuring 6 μm manufacturing process
- Toshiba TLCS-12, a microprocessor developed for the Ford EEC (Electronic Engine Control) system in 1973.
- Intel 8080 CPU launched in 1974 was manufactured using this process.
- The Television Interface Adaptor, the custom graphics and audio chip developed for the Atari 2600 in 1977.
- MOS Technology SID, a programmable sound generator developed for the Commodore 64 in 1982.
- MOS Technology VIC-II, a video display controller developed for the Commodore 64 in 1982 (5 μm).
Products featuring 3 μm manufacturing process
- Intel 8085 CPU launched in 1976.
- Intel 8086 CPU launched in 1978.
- Intel 8088 CPU launched in 1979.
- Motorola 68000 8 MHz CPU launched in 1979 (3.5 μm).
Products featuring 1.5 μm manufacturing process
- NEC's 64 kb SRAM memory chip in 1981.
- Intel 80286 CPU launched in 1982.
- The Amiga Advanced Graphics Architecture (initially sold in 1992) included chips such as Alice that were manufactured using a 1.5 μm CMOS process.
Products featuring 1 μm manufacturing process
- NTT's DRAM memory chips, including its 64 kb chip in 1979 and 256 kb chip in 1980.
- NEC's 1 Mb DRAM memory chip in 1984.
- Intel 80386 CPU launched in 1985.
Products featuring 800 nm manufacturing process
- NTT's 1 Mb DRAM memory chip in 1984.
- NEC and Toshiba used this process for their 4 Mb DRAM memory chips in 1986.
- Hitachi, IBM, Matsushita and Mitsubishi Electric used this process for their 4 Mb DRAM memory chips in 1987.
- Toshiba's 4 Mb EPROM memory chip in 1987.
- Hitachi, Mitsubishi and Toshiba used this process for their 1 Mb SRAM memory chips in 1987.
- Intel 486 CPU launched in 1989.
- microSPARC I launched in 1992.
- First Intel P5 Pentium CPUs at 60 MHz and 66 MHz launched in 1993.
Products featuring 600 nm manufacturing process
- Mitsubishi Electric, Toshiba and NEC introduced 16 Mb DRAM memory chips manufactured with a 600 nm process in 1989.
- NEC's 16 Mb EPROM memory chip in 1990.
- Mitsubishi's 16 Mb flash memory chip in 1991.
- Intel 80486DX4 CPU launched in 1994.
- IBM/Motorola PowerPC 601, the first PowerPC chip, was produced in 0.6 μm.
- Intel Pentium CPUs at 75 MHz, 90 MHz and 100 MHz.
Products featuring 350 nm manufacturing process
- Sony's 16 Mb SRAM memory chip in 1994.
- NEC VR4300 (1995), used in the Nintendo 64 game console.
- Intel Pentium Pro (1995), Pentium (P54CS, 1995), and initial Pentium II CPUs (Klamath, 1997).
- AMD K5 (1996) and original AMD K6 (Model 6, 1997) CPUs.
- Parallax Propeller, 8 core microcontroller.
Products featuring 250 nm manufacturing process
- Hitachi's 16 Mb SRAM memory chip in 1993.
- Hitachi and NEC introduced 256 Mb DRAM memory chips manufactured with this process in 1993, followed by Matsushita, Mitsubishi Electric and Oki in 1994.
- NEC's 1 Gb DRAM memory chip in 1995.
- Hitachi's 128 Mb NAND flash memory chip in 1996.
- DEC Alpha 21264A, which was made commercially available in 1999.
- AMD K6-2 Chomper and Chomper Extended. Chomper was released on May 28, 1998.
- AMD K6-III "Sharptooth" used 250 nm.
- Mobile Pentium MMX Tillamook, released in August 1997.
- Pentium II Deschutes.
- Dreamcast console's Hitachi SH-4 CPU and PowerVR2 GPU, released in 1998.
- Pentium III Katmai.
- Initial PlayStation 2's Emotion Engine CPU.
Processors using 180 nm manufacturing technology
- Intel Coppermine E- October 1999
- Sony PlayStation 2 console's Emotion Engine and Graphics Synthesizer – March 2000
- ATI Radeon R100 and RV100 Radeon 7000 – 2000
- AMD Athlon Thunderbird – June 2000
- Intel Celeron (Willamette) – May 2002
- Motorola PowerPC 7445 and 7455 (Apollo 6) – January 2002
Processors using 130 nm manufacturing technology
- Fujitsu SPARC64 V – 2001
- Gekko by IBM and Nintendo (GameCube console) – 2001
- Motorola PowerPC 7447 and 7457 – 2002
- IBM PowerPC G5 970 – October 2002 – June 2003
- Intel Pentium III Tualatin and Coppermine – 2001-04
- Intel Celeron Tualatin-256 – 2001-10-02
- Intel Pentium M Banias – 2003-03-12
- Intel Pentium 4 Northwood- 2002-01-07
- Intel Celeron Northwood-128 – 2002-09-18
- Intel Xeon Prestonia and Gallatin – 2002-02-25
- VIA C3 – 2001
- AMD Athlon XP Thoroughbred, Thorton, and Barton
- AMD Athlon MP Thoroughbred – 2002-08-27
- AMD Athlon XP-M Thoroughbred, Barton, and Dublin
- AMD Duron Applebred – 2003-08-21
- AMD K7 Sempron Thoroughbred-B, Thorton, and Barton – 2004-07-28
- AMD K8 Sempron Paris – 2004-07-28
- AMD Athlon 64 Clawhammer and Newcastle – 2003-09-23
- AMD Opteron Sledgehammer – 2003-06-30
- Elbrus 2000 1891ВМ4Я (1891VM4YA) – 2008-04-27 [1]
- MCST-R500S 1891BM3 – 2008-07-27 [2]
- Vortex 86SX – [3]
Commercial products using nano-scale MOSFETs
Chips using 90 nm manufacturing technology
- Sony–Toshiba Emotion Engine+Graphics Synthesizer (PlayStation 2) – 2003
- IBM PowerPC G5 970FX – 2004
- Elpida Memory's 90 nm DDR2 SDRAM process – 2005
- IBM PowerPC G5 970MP – 2005
- IBM PowerPC G5 970GX – 2005
- IBM Waternoose Xbox 360 Processor – 2005
- IBM–Sony–Toshiba Cell processor – 2005
- Intel Pentium 4 Prescott – 2004-02
- Intel Celeron D Prescott-256 – 2004-05
- Intel Pentium M Dothan – 2004-05
- Intel Celeron M Dothan-1024 – 2004-08
- Intel Xeon Nocona, Irwindale, Cranford, Potomac, Paxville – 2004-06
- Intel Pentium D Smithfield – 2005-05
- AMD Athlon 64 Winchester, Venice, San Diego, Orleans – 2004-10
- AMD Athlon 64 X2 Manchester, Toledo, Windsor – 2005-05
- AMD Sempron Palermo and Manila – 2004-08
- AMD Turion 64 Lancaster and Richmond – 2005-03
- AMD Turion 64 X2 Taylor and Trinidad – 2006-05
- AMD Opteron Venus, Troy, and Athens – 2005-08
- AMD Dual-core Opteron Denmark, Italy, Egypt, Santa Ana, and Santa Rosa
- VIA C7 – 2005-05
- Loongson (Godson) 2Е STLS2E02 – 2007-04
- Loongson (Godson) 2F STLS2F02 – 2008-07
- MCST-4R – 2010-12
- Elbrus-2C+ – 2011-11
Processors using 65 nm manufacturing technology
- Sony–Toshiba EE+GS (PStwo) – 2005
- Intel Pentium 4 (Cedar Mill) – 2006-01-16
- Intel Pentium D 900-series – 2006-01-16
- Intel Celeron D (Cedar Mill cores) – 2006-05-28
- Intel Core – 2006-01-05
- Intel Core 2 – 2006-07-27
- Intel Xeon (Sossaman) – 2006-03-14
- AMD Athlon 64 series (starting from Lima) – 2007-02-20
- AMD Turion 64 X2 series (starting from Tyler) – 2007-05-07
- AMD Phenom series
- IBM's Cell Processor – PlayStation 3 – 2007-11-17
- IBM's z10
- Microsoft Xbox 360 "Falcon" CPU – 2007–09
- Microsoft Xbox 360 "Opus" CPU – 2008
- Microsoft Xbox 360 "Jasper" CPU – 2008–10
- Microsoft Xbox 360 "Jasper" GPU – 2008–10
- Sun UltraSPARC T2 – 2007–10
- AMD Turion Ultra – 2008-06
- TI OMAP 3 Family – 2008-02
- VIA Nano – 2008-05
- Loongson – 2009
- NVIDIA GeForce 8800GT GPU – 2007
Processors using 45 nm technology
- Matsushita released the 45 nm Uniphier in 2007.
- Wolfdale, Yorkfield, Yorkfield XE and Penryn are Intel cores sold under the Core 2 brand.
- Intel Core i7 series processors, i5 750 (Lynnfield and Clarksfield)
- Pentium Dual-Core Wolfdale-3M are current[when?] Intel mainstream dual core sold under the Pentium brand.
- Diamondville, Pineview are current[when?] Intel cores with hyper-threading sold under the Intel Atom brand.
- AMD Deneb (Phenom II) and Shanghai (Opteron) Quad-Core Processors, Regor (Athlon II) dual core processors [4], Caspian (Turion II) mobile dual core processors.
- AMD (Phenom II) "Thuban" Six-Core Processor (1055T)
- Xenon in the Xbox 360 S model.
- Sony–Toshiba Cell Broadband Engine in PlayStation 3 Slim model – September 2009.
- Samsung S5PC110, as known as Hummingbird.
- Texas Instruments OMAP 36xx.
- IBM POWER7 and z196
- Fujitsu SPARC64 VIIIfx series
- Espresso (microprocessor) Wii U CPU
Chips using 32 nm technology
- Toshiba produced commercial 32 Gb NAND flash memory chips with the 32 nm process in 2009.
- Intel Core i3 and i5 processors, released in January 2010
- Intel 6-core processor, codenamed Gulftown
- Intel i7-970, was released in late July 2010, priced at approximately US$900
- AMD FX Series processors, codenamed Zambezi and based on AMD's Bulldozer architecture, were released in October 2011. The technology used a 32 nm SOI process, two CPU cores per module, and up to four modules, ranging from a quad-core design costing approximately US$130 to a $280 eight-core design.
- Ambarella Inc. announced the availability of the A7L system-on-a-chip circuit for digital still cameras, providing 1080p60 high-definition video capabilities in September 2011
Chips using 24–28 nm technology
- SK Hynix announced that it could produce a 26 nm flash chip with 64 Gb capacity; Intel Corp. and Micron Technology had by then already developed the technology themselves. Announced in 2010.
- Toshiba announced that it was shipping 24 nm flash memory NAND devices on August 31, 2010.
- In 2016 MCST's 28 nm processor Elbrus-8S went for serial production.
Chips using 22 nm technology
- Intel Core i7 and Intel Core i5 processors based on Intel's Ivy Bridge 22 nm technology for series 7 chip-sets went on sale worldwide on April 23, 2012.
Chips using 20 nm technology
- Samsung Electronics began mass production of 64 Gb NAND flash memory chips using a 20 nm process in 2010.
- Nvidia Tegra X1 (Nintendo Switch and Nvidia Shield TV)
Chips using 16 nm technology
- TSMC first began 16 nm FinFET chip production in 2013.
- Nvidia Tegra X1+ (later Nintendo Switch and Nvidia Shield TV models)
Chips using 14 nm technology
- Intel Core i7 and Intel Core i5 processors based on Intel's Broadwell 14 nm technology was launched in January 2015.
- AMD Ryzen processors based on AMD's Zen or Zen+ architectures and which uses 14 nm FinFET technology.
Chips using 10 nm technology
- Samsung announced that it had begun mass production of multi-level cell (MLC) flash memory chips using a 10 nm process in 2013. On 17 October 2016, Samsung Electronics announced mass production of SoC chips at 10 nm.
- TSMC began commercial production of 10 nm chips in early 2016, before moving onto mass production in early 2017.
- Samsung began shipping Galaxy S8 smartphone in April 2017 using the company's 10 nm processor.
- Apple delivered second-generation iPad Pro tablets powered with TSMC-produced Apple A10X chips using the 10 nm FinFET process in June 2017.
Chips using 7 nm technology
- TSMC began risk production of 256 Mbit SRAM memory chips using a 7 nm process in April 2017.
- Samsung and TSMC began mass production of 7 nm devices in 2018.
- Apple A12 and Huawei Kirin 980 mobile processors, both released in 2018, use 7 nm chips manufactured by TSMC.
- AMD began using TSMC 7 nm starting with the Vega 20 GPU in November 2018, with Zen 2-based CPUs and APUs from July 2019, and for both PlayStation 5 and Xbox Series X/S consoles' APUs, released both in November 2020.
Chips using 5 nm technology
- Samsung began production of 5 nm chips (5LPE) in late 2018.
- TSMC began production of 5 nm chips (CLN5FF) in April 2019.
Chips using 3 nm technology
- TSMC have announced plans to release 3 nm devices during 2021–2022.
- Samsung Electronics have begun risk production of 3 nm GAAFET transistors in June 2022.
- Apple A17 Pro (iPhone 15 Pro)
See also
- Foundry model
- MOSFET
- Semiconductor device fabrication
- Transistor count
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